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Nano-Fabrication

Facility Type: Smaller or Individual Faculty Laboratory
 

The Nanofabrication Facility at the Department of Physics and Astronomy at Rutgers University is located in a new class 100-1000 clean room (total area 650 sq. ft.). It includes the electron-beam lithography system based on the thermal-field-emitter SEM Sirion (FEI Company) equipped with the e-beam writing attachment (J C Nabity Lithography Systems) (Fig. 1), three thin-film deposition systems for magnetron sputtering, electron-gun deposition, and thermal evaporation of thin films of metals and dielectrics (Fig. 2), and a dry-etching system. The resolution of e-beam lithography is ~ 20 nm; the structures with dimensions <100 nm are routinely fabricated.

Contact:
Michael E. Gershenson
Professor of Physics
SAS - Physics & Astronomy
136 Frelinghuysen Rd.
Piscataway, NJ 08854
Tel: 732-445-3180
Fax: 732-445-4343
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Electron-beam Lithography System
the electron-beam lithography system based on the thermal-field-emitter SEM Sirion (FEI Company) equipped with the e-beam writing attachment (J C Nabity Lithography Systems)
Thin-film Deposition System
thin-film deposition systems for magnetron sputtering, electron-gun deposition, and thermal evaporation of thin films of metals and dielectrics (Fig. 2), and a dry-etching system.

Contact Us

NR03HamiltonGate 607 Taylor Road
Piscataway, NJ 08854

P   848-445-1388
Email Us