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hybrid perovskite single crystals
rubrene OFETs

Nano-Fabrication

Facility Type: Smaller or Individual Faculty Laboratory
 

The Nanofabrication Facility at the Department of Physics and Astronomy at Rutgers University is located in a new class 100-1000 clean room (total area 650 sq. ft.). It includes the electron-beam lithography system based on the thermal-field-emitter SEM Sirion (FEI Company) equipped with the e-beam writing attachment (J C Nabity Lithography Systems) (Fig. 1), three thin-film deposition systems for magnetron sputtering, electron-gun deposition, and thermal evaporation of thin films of metals and dielectrics (Fig. 2), and a dry-etching system. The resolution of e-beam lithography is ~ 20 nm; the structures with dimensions <100 nm are routinely fabricated.

Contact:
Michael E. Gershenson
Professor of Physics
SAS - Physics & Astronomy
136 Frelinghuysen Rd.
Piscataway, NJ 08854
Tel: 732-445-3180
Fax: 732-445-4343
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Electron-beam Lithography System
the electron-beam lithography system based on the thermal-field-emitter SEM Sirion (FEI Company) equipped with the e-beam writing attachment (J C Nabity Lithography Systems)
Thin-film Deposition System
thin-film deposition systems for magnetron sputtering, electron-gun deposition, and thermal evaporation of thin films of metals and dielectrics (Fig. 2), and a dry-etching system.

Advancing Nanotechnology - IAMDN New Microscopes

 

Rutgers new scanning transmission electron microscope and new helium ion microscope help researchers develop nanotechnology used to fight cancer, generate power, and create more powerful electronics. Watch the video to learn more.

Click here for additional Rutgers News.

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Piscataway, NJ 08854

P   848-445-1388
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